Quinas Technology Advances UltraRAM Development with Atomic-Scale Processing at Kaust Core Labs

Quinas Technology Ltd, developer of the disruptive UltraRAM non-volatile memory technology, has announced a significant milestone in its research and development programme, confirming the use of Atomic Layer Etching (ALE) to fabricate and refine its quantum-engineered device structures at Kaust Core Labs in Saudi Arabia.The work builds on more than a decade of foundational quantum device research conducted at Lancaster University, with advanced atomic-scale processing now being carried out at Kaust Core Labs using Oxford Instruments’ ALE technology. This combination provides sub-nanometre control with ultra-low damage processing, a critical requirement for the precisely engineered quantum well heterostructures that underpin UltraRAM.

UltraRAM is a novel memory technology designed to combine DRAM-class speed with non-volatile data retention, offering the potential for significant improvements in energy efficiency and system performance. Achieving this requires exceptional control of interfaces and layer thickness within complex III–V semiconductor structures, making atomic-scale fabrication techniques ideal.

“Atomic-scale control of our quantum well structures is fundamental to UltraRAM,” said James Ashforth-Pook, CEO and co-founder, Quinas Technology. “Working with Kaust Core Labs and leveraging Oxford Instruments’ Atomic Layer Etching technology gives us access to one of the world’s most advanced and credible environments for low-damage semiconductor R&D.”

Kaust Core Labs are internationally recognised for their leadership in advanced nanofabrication, plasma processing, and compound semiconductor research, supporting both academic excellence and industrial technology development.

“Kaust Core Labs support cutting-edge semiconductor research through advanced nanofabrication facilities and atomic-scale processing tools designed for low-damage device development,” said Dr Kenneth Kennedy, director, nano fabrication, Kaust Core Lab.

“Atomic Layer Etching enables precise, low-damage fabrication of nanoscale device features and is increasingly used in advanced semiconductor research and production environments worldwide. We are pleased that Quinas are using Oxford Instruments ALE systems at Kaust Core Labs to fabricate their UltraRAM devices – Kaust is a long time customer of Plasma Technology with a suite of ALE and Atomic Layer Deposition (ALD) systems including the latest in ALD technology, the PlasmaPro ASP,” said Harriet van der Vliet, head, strategic R&D markets, Oxford Instruments Plasma Technology.

This milestone reflects Quinas Technology’s growing engagement with Saudi Arabia’s advanced research ecosystem as part of its global R&D strategy and strengthens the company’s position as it progresses UltraRAM towards prototype demonstration and future engagement with industrial partners, foundries, and strategic investors.