SK hynix Chooses Infinitesima Metron 3D 300mm System for In-line Process Control

Infinitesima announced that SK hynix, Inc. has adopted the Metron^3D 300mm in-line wafer metrology system and released it for use in volume production.

The Metron^3D provides 3D process control with sub-nanometre accuracy, crucial for fabrication of SK hynix’s next-gen memory devices. The release to production follows an extensive evaluation period, applying the system for characterization across multiple process steps.

Mr. Young-Hyun Choi, head, DMI (Defect Analysis, Metrology and Inspection Technology), stated, “Three-dimensional process control at the nano-scale level is becoming increasingly important to ensure high yield in advanced DRAM processes. Infinitesima’s Metron^3D has demonstrated excellent sub-nanometre 3D metrology with the required cost-of-ownership necessary for HVM implementation.”

The Metron^3D features Infinitesima’s proprietary Rapid Probe Microscope (RPM) technology that provides AFM measurement capability at 10× to 100× typical AFM throughput. The system’s capabilities also include fully automated wafer, data, and probe handling, making it optimal for in-line volume production of semiconductor devices. The investment in this metrology solution highlights SK hynix’s commitment to maintaining technical leadership in the development and manufacture of computer memory.

“We are delighted to be working with SK hynix; their support and guidance has enabled rapid qualification of our Metron^3D system and deployment in HVM,” stated Peter Jenkins, president and CEO, Infinitesima.