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BeSang Assigned Patent

Novel 3D NVM

BeSang, Inc., Hillsboro, OR, has been assigned a patent (12010853) developed by Lee; Sang-Yun, Hillsboro, OR, for methods for novel three-dimensional nonvolatile memory.

The abstract of the patent published by the U.S. Patent and Trademark Office states: “Disclosed are novel structures and methods for 3D NVM built with vertical transistors above a logic layer. A first embodiment has a conductive film under the transistors and serving as a common node in a memory block. The conductive film may be from a semiconductor layer used to build the transistors. Metal lines are disposed above the transistors for connection through 3D vias to underlying circuitry. Contact plugs may be formed between transistors and metal lines. The conductive film may be coupled to underlying circuitry through contacts on the conductive film or through interconnect vias underneath the film. A second embodiment has conductive lines disposed under the transistors. Either of conductive lines and metal lines may serve as source lines and the other as bit lines for the memory. For low parasitic resistances, the conductive lines may be shorted to bypass metal lines residing in underlying logic layer.

The patent application was filed on 2021-06-14 (17/347237).