Asahi Kasei Microdevices Assigned Patent

Asahi Kasei Microdevices Corporation, Tokyo, Japan, has been assigned a patent (11,004,947) developed by Gunji, Tomohiro, and Tsushima, Yuukou, Tokyo, Japan, for a “nonvolatile storage element.“

The abstract of the patent published by the U.S. Patent and Trademark Office states: ”The object of the present invention is to provide a nonvolatile storage element capable of suppressing retention degradation. A nonvolatile storage element is provided with a semiconductor substrate and a floating gate provided above the semiconductor substrate, in which the floating gate has an area of 30 .mu.m.sup.2 or more.”

The patent application was filed on May 23, 2019 (Appl. No.16/420,692).