Versum Materials Assigned Patent

Versum Materials US, LLC, Tempe, AZ, has been assigned a patent (10,985,013) developed by Li, Jianheng, Ridgeway, Robert G., Lei, Xinjian, Vrtis, Raymond N., Han, Bing, and Rao, Madhukar B., Tempe, AZ, for “method and precursors for manufacturing 3D devices.“

The abstract of the patent published by the U.S. Patent and Trademark Office states: ”Described herein is an apparatus comprising a plurality of silicon-containing layers wherein the silicon-containing layers are selected from a silicon oxide and a silicon nitride layer or film. Also described herein are methods for forming the apparatus to be used, for example, as 3D vertical NAND flash memory stacks. In one particular aspect or the apparatus, the silicon oxide layer comprises slightly compressive stress and good thermal stability. In this or other aspects of the apparatus, the silicon nitride layer comprises slightly tensile stress and less than 300 MPa stress change after up to about 800.degree. C. thermal treatment. In this or other aspects of the apparatus, the silicon nitride layer etches much faster than the silicon oxide layer in hot H.sub.3PO.sub.4, showing good etch selectivity.”

The patent application was filed on June 4, 2019 (Appl. No.16/430,882).