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R&D: Next Gen Ferroelectric Materials for Semiconductor Process Integration and Applications

Paper discusses prospects of both material systems in various applications.

Journal of Applied Physics has published an article written by T. Mikolajick, NaMLab gGmbH, Noethnitzer Str. 64, D-01187 Dresden, Germany, and Institute of Semiconductors and Microsystems (IHM), TU Dresden, D-01062 Dresden, Germany, S. Slesazeck, H. ...

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