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R&D: 40nm 1T–1MTJ 128 Mb STT-MRAM With Novel Averaged Reference Voltage Generator Based on Detailed Analysis of Scaled-Down Memory Cell Array Design

Demonstrating circuit operation, 128Mb STT-MRAM chip designed and fabricated using 40nm CMOS and 37nm MTJ technologies

IEEE Transactions on Magnetics has published an article written by Hiroki Koike, Takaho Tanigawa, Toshinari Watanabe, Takashi Nasuno, Yasuo Noguchi, Mitsuo Yasuhira, Toru Yoshiduka, Center for Innovative Integrated Electronic Systems, Tohoku University, Sendai, Japan, Yitao Ma, Center for Innovative Integrated Electronic Systems, Tohoku University, Sendai, Japan, and Center for Science and Innovation in Spintronics, Tohoku University, Sendai, Japan, and Research Institute of Electrical Communication, Tohoku University, Sendai, Japan, Hiroaki Honjo, Koichi Nishioka, Sadahiko Miura, Hirofumi Inoue, Center for Innovative Integrated Electronic Systems, Tohoku University, Sendai, Japan, Shoji Ikeda, Center for Innovative Integrated Electronic Systems, Tohoku University, Sendai, Japan, Center for Science and Innovation in Spintronics, Tohoku University, Sendai, Japan, Research Institute of Electrical Communication, Tohoku University, Sendai, Japan, and Center for Spintronics Research Network, Tohoku University, Sendai, Japan, Tetsuo Endoh, Center for Innovative Integrated Electronic Systems, Tohoku University, Sendai, Japan, Center for Science and Innovation in Spintronics, Tohoku University, Sendai, Japan, Research Institute of Electrical Communication, Tohoku University, Sendai, Japan, Center for Spintronics Research Network, Tohoku University, Sendai, Japan, and Graduate School of Engineering, Tohoku University, Sendai, Japan.

Abstract: The development of STT-MRAM technology is currently in progress and has been successively disclosed by major LSI vendors recently. In order to advance STT-MRAM technology and expand its areas of application, challenges relative to further device scaling need to be addressed. In this study, an increased wiring resistance in a deep sub-100 nm process by which the read operation yield is degraded was analyzed. The yield degradation was quantified by analyzing the conventional cell array using Monte-Carlo SPICE simulations. A new circuit was proposed to decrease the fail bit rate by an averaged reference voltage ( Vref ) generator. The simulated results indicated that the new Vref generator improved the fail bit rate by 1 order of magnitude compared to the conventional array. To demonstrate the circuit operation, a 128Mb STT-MRAM chip was designed and fabricated using 40 nm CMOS and 37 nm MTJ technologies. For the first time, the chip measurements successfully demonstrated the operation of the proposed device-variation tolerant array architecture with the averaged Vref generator, presenting a 30 ns read access time.

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