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Weebit Nano ReRAM Test Results Show Improvements for Technology Manufacturing

Partner Leti confirms ReRAM can be manufactured using single added mask in embedded designs, novel methods improve yield.

Weebit Nano Ltd. has confirmed test results showing its arrays can be manufactured for embedded applications with a single added mask, as the company continues towards productisation.

Weebit Nano Reram Technology

Testing conducted over recent months with research partner Leti, the French research institute recognised in the field of micro-electronics, confirmed it is possible to produce the company’s ReRAM technology as an embedded memory using 2, or possibly only 1, additional mask, compared to the seven to ten additional masks normally required for current flash memory. A second study by the joint Weebit-Leti team confirms novel methodologies can improve production yield by mitigating device malfunctions. These achievements can benefit manufacturing costs and potential profits.

Semiconductor devices are produced by depositing layers of different materials, one on top of the other, patterning them through masks in a series of steps. When going to geometries below 28nm the mask set required to produce a semiconductor device can cost millions of dollars. The first report from Leti confirms that a ‘one additional mask’ strategy is possible and defines the trade-offs between using 1 and 2 masks.

During the production of semiconductor wafers, there are always challenges resulting from the fact that some of the dies on the wafer malfunction due to the delicate production process. One of the biggest challenges in semiconductors is to improve the yield (number of working dies per wafer) trying to get closer to 100% , as this has a direct impact on the profits from the device.

The second report from Leti analyses the different causes for malfunctions in ReRAM devices and defines ways to avoid or fix these issues in ways which can improve the yield and increase the profitability of each device.

Coby Hanoch, CEO, Weebit Nano, said: “To date, Weebit has been working in a development fab where the focus was on producing a viable silicon oxide memory technology. Now that the technical parameters of our ReRAM technology are at the forefront of the market and we are in the process of moving to production facilities, issues like the number of masks and yield become very important and can make a significant impact on the speed of the company’s progress. The reports from Leti are very encouraging. In discussions with prospective customers, any efficiencies such as reduced mask rates and yield improvements have been high on their agenda as they seek to optimise the production process and supplier chain. With Weebit arrays now being confirmed as being able to use a smaller number of masks while providing increased yield we will be able to save our customers millions of dollars, reduce manufacturing times and decrease error risks in their production processes.

Read also:
Weebit Nano Secured $3.1 Million
And signed letter of intent with Chinese memory solutions company XTX to investigate use of SiOx ReRAM technology in its products.
October 29, 2019 | Press Release
Weebit Nano and XTX Technology Signed Letter-of-Intent for SiOx ReRAM Technology
Identified potential for co-operation by using SiOx ReRAM technology to replace some of XTX’s products that are based on older technologies reaching limits of capability
August 22, 2019 | Press Release
Kitec Design Korean, Market Representative of Weebit Nano
With first potential customer
August 2, 2019 | Press Release
FMS: Weebit Nano and CEA-Leti Brain-Inspired Neuromorphic Using SiOx ReRAM Technology Demo
Combining artificial spiking neural networks technology and SiOx ReRAM technology may accelerate development of brain-inspired architectures.
July 24, 2019 | Press Release
Weebit Nano and Leti File Two Patents
Optimizing ReRAM performance
June 19, 2019 | Press Release

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