Min Airk Technology Assigned Patent

Min Airk Technology Co., Ltd., Taoyuan, Taiwan, has been assigned a patent (10,053,557) developed by Lin, Chi-En, Taoyuan, Taiwan, Chang, Jung-Pao, Kaohsiung, Taiwan, and Chi, Hung-Yu, New Taipei, Taiwan, for a “low wear debris polyoxymethylene composition and a ramp made of such polyoxymethylene composition suitable for various HDD designs.“

The abstract of the patent published by the U.S. Patent and Trademark Office states: “A polyoxymethylene composition includes a polyoxymethylene copolymer with 1,3-dioxolane as a comonomer, a wear resistance agent, a nucleating agent, and an antistatic agent. A ramp is made of the polyoxymethylene composition. The ramp and the polyoxymethylene have excellent low-wear-debris property. The low wear debris polyoxymethylene composition can be used to produce a ramp for many different designs of hard disks, such as PMR, (perpendicular recording)+TDMR, (Two-Dimensional Magnetic Recording), SMR, (Shingled Magnetic Recording), HAMR.sup.+, HAMR, (Heat Assisted Magnetic Recording)+SMR+TDMR, BPMR.sup.+, (BPMR, Bit Pattern Media Recording)+SMR+TDMR, and helium-filled hard disk.”

The patent application was filed on September 22, 2016 (15/272,447).