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Quantum Optical Lithography Ready to Transfer Patterns on Silicon Wafer

Paper presented by Storex Technologies
This is a Press Release edited by on 2013.05.20

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Storex Technologies, Inc. was established in 2007 and develops materials and systems for petabyte 3D optical data storage and optical nanolithography.

In a paper presented at Nanotech 2013, Washington DC, in May, the company announced that Quantum Optical Lithography was applied to semiconductor technology to transfer patterns on silicon wafer.

In its presentation, the team discussed about resolution and the method of patterns transfer.

Dr. Eugen Pavel, CEO of Storex Technologies and his team from Politehnica University of Bucharest, three research institutes from Romania-National Institute for R&D of Isotopic and Molecular Technologies, National Institute for Lasers, Plasma and Radiation Physics, National Institute for R&D in Microtechnologies - Metav R&D, Agilent Technologies and Japan Advanced Institute of Science and Technology, have developed Quantum Optical Lithography able to be used with fluorescent photosensitive glass-ceramics and resists, at a resolution of 1nm.

The new greatly improves the resolution previously achievable by electron beam lithography (EBL) and electron beam-induced deposition (EBID).

The findings about Quantum Optical Lithography were published March 15 in Optics Communications.

The patterns transfer on silicon wafer place Quantum Optical Lithography into the discussion of future lithography technologies for semiconductor manufacturing.