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Research from Swinburne University in Australia

By Jean Jacques Maleval | June 21, 2013 at 2:54 pm

To read this article from Nature Communications, click on:
Three-dimensional deep sub-diffraction optical beam lithography with 9nm feature size
Here we report on three-dimensional optical beam lithography with 9nm feature size and 52nm two-line resolution in a newly developed two-photon absorption resin with high mechanical strength.

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