What are you looking for ?
Infinidat
Articles_top

R&D: Ultrahigh Index and Low-loss Silicon Rich Nitride Thin Film for NIR HAMR Optics

Thermal optic characterization shows thermal optical coefficient of 2.66 × 10-4 K-1 with stable optical absorption at temperature up to 200°C.

IEEE Transactions on Magnetics has published an article written by Kim Peng Lim, Vivek Krishnamurthy, Ji Feng Ying, Jing Pu, and Qian Wang, Agency for Science, Technology and Research, Data Storage Institute, Singapore.

Abstract:Ultrahigh index and low-loss silicon rich nitride (SiNx) thin-film material is developed and studied for application in heat-assisted magnetic recording (HAMR) as light delivery system operating in the near infrared (NIR) wavelength range. The film is deposited by low-temperature inductively coupled plasma chemical vapour deposition and developed through the tuning of SiH4/N2/Ar gases ratio. Film characterization of SiNx, including material composition, optical properties, and thermal-optics is presented. X-ray photoelectron spectroscopy shows the spectrum of binding energy and a material composition of x = 0.6. The refractive index of developed film is >3.0 with an optical bandgap around 656 nm according to ellipsometery and photospectrometery measurement. Characterization of ultra-low optical absorption is addressed with the use of ellipsometry and prism coupler waveguide loss measurement and the developed film has an absorption coefficient of about 10-5 in the NIR. The thermal optic characterization shows a thermal optical coefficient of 2.66 × 10-4 K-1 with a stable optical absorption at temperature up to 200 °C. The use of the developed SiNx film for HAMR as high-index contrast nanowaveguide and enabling to integrate III-V semiconductor laser for a fully integrated light delivery system is discussed.

Articles_bottom
AIC
ATTO
OPEN-E